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Laser induced damage is one of the main research topics of the ILM team and we try to covera large range of irradiation conditions where laser induced damage in optical materials is an issue. We run damage test benches for different pulse durations and different wavelengths described in the following table :
| Laser damage testing | |||||
|---|---|---|---|---|---|
| sub-picosecond | Nanosecond | CW | |||
| 1030/515/343nm | 1064/532/355/266nm ; 600-900nm ; 2-5µm | 1064/532/355/266nm | 1064nm | 1064nm | 800nm |
| 450-3ps | 12ns, SLM | 12ns, SLM | 6ns | ||
| 10Hz-100kHz | 10Hz | 100Hz | 20Hz | ||
| 1mJ max / pulse | 1.5J max / pulse | 800mJ max / pulse | 50mJ max / pulse | 200W | |
| Description | |||||
| 1on1, Son1, Ron1 automated tests | |||||
| Possibilities : vacuum chamber, variable angle of incidence and polarization, resistance to a fixed fluence,... | |||||
Different systems (commercial or developped in the team) are available to measure properties of the materials (nonlinear refractive index, weak and local absorption, photoluminescence, strain…) before/after laser irradiation :
| Non-destructive analytical tools | |||||||
|---|---|---|---|---|---|---|---|
| Confocal microscope | SEM | Nomarski microscope | Polariscope | Photothermal measurements | Lossmeter | Luminescence | Non-linear optical properties |
| Reflection and Luminescence | stress measurements | Absorption at 244, 355, 488nm | Loss measurements (absorption and scattering) at 1064/532/355nm | Time-resolved luminescence (ns), excitation at 355/266nm | Based on a z-scan bench | ||
Different experimental set-up are dedicated to laser material processing for optical or microelectronics applications :
| Laser processing | |
|---|---|
| Laser damage mitigation bench | Laser ablation |
| Mitigation of laser damage on silica with CO2 laser irradiation | femtosecond laser ablation of thin films with galvometric head |
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