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Laser induced damage is one of the main research topics of the ILM team and we try to covera large range of irradiation conditions where laser induced damage in optical materials is an issue. We run damage test benches for different pulse durations and different wavelengths described in the following table:

Laser damage testing
sub-picosecond Nanosecond CW
1030/515/343nm 1064/532/355/266nm ; 600-900nm ; 2-5µm 1064/532/355/266nm 1064nm 1064nm 800nm
450-3ps 12ns, SLM 12ns, SLM 6ns
10Hz-100kHz 10Hz 100Hz 20Hz
1mJ max / pulse 1.5J max / pulse 800mJ max / pulse 50mJ max / pulse 200W
1on1, Son1, Ron1 automated tests
Possibilities : vacuum chamber, variable angle of incidence and polarization, resistance to a fixed fluence,...

Different systems (commercial or developped in the team) are available to measure properties of the materials (nonlinear refractive index, weak and local absorption, photoluminescence, strain…) before/after laser irradiation:

Non-destructive analytical tools
Confocal microscope SEM Nomarski microscope Polariscope Photothermal measurements Lossmeter Luminescence Non-linear optical properties
Reflection and Luminescence stress measurements Absorption at 244, 355, 488nm Loss measurements (absorption and scattering) at 1064/532/355nm Time-resolved luminescence (ns), excitation at 355/266nm Based on a z-scan bench

Different experimental set-up are dedicated to laser material processing for optical or microelectronics applications:

Laser processing
Laser damage mitigation bench Laser ablation
Mitigation of laser damage on silica with CO2 laser irradiation femtosecond laser ablation of thin films with galvometric head