Team : Thématiques
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Polarization-based measurements
Principal investigator : Miguel A. Alonso
Keywords : polarization, SEO, q-plate, shearing interferometry, birefringence, scatterometry.
This work involves the measurement of nanostructures by using light with tailored polarization distributions, the measurement of the phase of light by using polarization-modifying optical elements, and the measurement of the polarization of light. These measurements are based on the use of spatially-varying birefringent optical elements such as stressed-engineered optics (SEOs) and liquid crystal devices.
Publications
2021
L.A. Alemán-Castañeda , F. Zvietcovich, and K.J. Parker
IEEE Journal of Selected Topics in Quantum Electronics 27, 7201312 (2021)
2020
V. Curcio, L.A. Alemán-Castañeda, T.G. Brown, S. Brasselet and M.A. Alonso
Nature Comm. 11, 5307 (2020)
A. Vella and M.A. Alonso
Chapter 7 of Progress in Optics 65 (Elsevier, Amsterdam, 2020) pp. 231-311 (2020).
2019
A.J. Vella and M.A. Alonso
Opt. Express 27, 36799-36814 (2019).
A. Vella, S.T. Head, T.G. Brown, and M.A. Alonso
Phys. Rev. Lett. 122, 123603 (2019).
L.A. Alemán-Castañeda, B. Piccirillo, E. Santamato, L. Marrucci, and M.A. Alonso
Optica 6, 396-399 (2019).
2018
A. Vella and M.A. Alonso
Opt. Lett. 43, 379-382 (2018).
K.A. Sharma, G. Costello, E. Vélez-Juárez, T.G. Brown and M.A. Alonso
Opt. Express 26, 8301-8313 (2018).
M.A. Alonso and A. Vella
17th Workshop on Information Optics (WIO), IEEE 1-3 (2018). doi : 10.1109/WIO.2018.8643458
2016
S. Sivankutti, E.R. Andresen, G. Bowmans, T.G. Brown, M.A. Alonso, and H. Rigneault
Opt. Lett. 41, 2105-2108 (2016).
2014
B.G. Zimmerman, R. Ramkhalawon, M.A. Alonso, and T.G. Brown
Three-Dimensional and Multidimensional Microscopy : Image Acquisition and Processing XXI, SPIE proceeding 8949, 894912 (2014).
T.G. Brown, M.A. Alonso, A. Vella, M.J. Theisen, S.T. Head, S.R. Gillmer, and J.D. Ellis
Three-Dimensional and Multidimensional Microscopy : Image Acquisition and Processing XXI, SPIE proceeding 8949, 89490Y (2014).
T.G. Brown, M.A. Alonso, A. Vella, M.J. Theisen, and S.T. Head
Metrology, Inspection, and Process Control for Microlithography XXVIII, SPIE proceeding 9050, 90501F (2014).
2013
R. Ramkhalawon, T.G. Brown, and M.A. Alonso
Opt. Express 21, 4106-4115 (2013).