Team : Thématiques

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Polarization-based measurements

Principal investigator : Miguel A. Alonso

Keywords : polarization, SEO, q-plate, shearing interferometry, birefringence, scatterometry.

This work involves the measurement of nanostructures by using light with tailored polarization distributions, the measurement of the phase of light by using polarization-modifying optical elements, and the measurement of the polarization of light. These measurements are based on the use of spatially-varying birefringent optical elements such as stressed-engineered optics (SEOs) and liquid crystal devices.

Publications

2019
Shearing interferometry via geometric phase
L.A. Alemán-Castañeda, B. Piccirillo, E. Santamato, L. Marrucci, and M.A. Alonso
Optica accepted (2019).
2018
Poincaré sphere representation for spatially varying birefringence
A. Vella and M.A. Alonso
Opt. Lett. 43, 379-382 (2018).
Measuring vector field correlations using diffraction
K.A. Sharma, G. Costello, E. Vélez-Juárez, T.G. Brown and M.A. Alonso
Opt. Express 26, 8301-8313 (2018).
Birefringent distributions tailored for imaging and other applications
M.A. Alonso and A. Vella
17th Workshop on Information Optics (WIO), IEEE 1-3 (2018). doi : 10.1109/WIO.2018.8643458
2016
Single shot polarimetry of multicore fiber
S. Sivankutti, E.R. Andresen, G. Bowmans, T.G. Brown, M.A. Alonso, and H. Rigneault
Opt. Lett. 41, 2105-2108 (2016).
2014
Pinhole array implementation of Star Test Polarimetry
B.G. Zimmerman, R. Ramkhalawon, M.A. Alonso, and T.G. Brown
Three-Dimensional and Multidimensional Microscopy : Image Acquisition and Processing XXI, SPIE proceeding 8949, 894912 (2014).
Focused beam scatterometry for deep subwavelength metrology
T.G. Brown, M.A. Alonso, A. Vella, M.J. Theisen, S.T. Head, S.R. Gillmer, and J.D. Ellis
Three-Dimensional and Multidimensional Microscopy : Image Acquisition and Processing XXI, SPIE proceeding 8949, 89490Y (2014).
Weak measurements applied to process monitoring using focused beam scatterometry
T.G. Brown, M.A. Alonso, A. Vella, M.J. Theisen, and S.T. Head
Metrology, Inspection, and Process Control for Microlithography XXVIII, SPIE proceeding 9050, 90501F (2014).
2013
Imaging the polarization of a light field
R. Ramkhalawon, T.G. Brown, and M.A. Alonso
Opt. Express 21, 4106-4115 (2013).