Photonics Facility

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Photonics Facility


The main goal of the Photonics Facility is to create a regional platform for the fabrication and characterization of optical thin films by employing the most advanced technology and equipment available world-wide. The activities will be supported by the expertise developed at the Fresnel Institute, which itself represents a unique, internationally recognized research environment in this field.

The Photonics Facility will host a set of equipment which is indispensable in all stages of the fabrication of optical interference systems. It includes equipment for the substrate preparation step (control and reduction of surface roughness, cleaning station), for the film fabrication step (high performance deposition system), as well as for the final characterization step (control of the shape and roughness of the component, spectrophometric evaluation).